Reuniting AirPods with a few clever tricks

Introduces how people with disabilities, including people with age-related impairments, use the Web.

A high-level exploration of handling multiple sets of pricing and entitlements so no customers are ever forced to upgrade.

AI wearables. Put it on, speak, transcribe, automatically - BasedHardware/omi

Lionsgate has dropped the marketing consultant who included AI-generated quotes from critics in the latest "Megalopolis" trailer.

$TSLAQ $TSLA Tesla has taken down their 2016 release noting all Tesla’s come with the hardware capable of full self driving, it now redirects to their blog. Only accessible via the Wayback machine now. https://t.co/2rJS0zn0YT

Author-paid publication fees, often associated with so-called “gold” open access journals, lead to the corruption of science by incentivizing the publication of low-quality research and exacerbate inequalities between institutions that are prestigious and…

LM Studio 0.3.0 is here! Built-in (naïve) RAG, light theme, internationalization, Structured Outputs API, Serve on the network, and more.

Prepare Raspberry Pi 3, 4 & 5 configurations using a virtual machine. - ptrsr/pi-ci

The iPhone 16 and iPhone 16 Pro could let you set the Camera app to use 3x smaller JPEG-XL files instead of JPEG when shooting images.

Sometimes, companies make what seems, on the surface, technically poor decisions. I consider this the case with Canon’s new R5 Mark ii (and R1) dropping support for sensor Pixel Shifting High…

A collection of bad practices in HTML, copied from real websites.

A community site for the development of the TextBundle standard

Dear ImGui: Bloat-free Graphical User interface for C++ with minimal dependencies - ocornut/imgui

A set of recipes for using Makefiles for web development.

Repository with text of DMCA takedown notices as received. GitHub does not endorse or adopt any assertion contained in the following notices. Users identified in the notices are presumed innocent u...

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The Okinawa Institute of Science and Technology (OIST) has designed a new type of extreme ultraviolet (EUV) lithography equipment that could significantly